ENTRY A0649 20210315 A097A064900000001 SUBENT A0649001 20210315 A097A064900100001 BIB 9 21 A064900100002 TITLE Elastic scattering cross sections of protons by copper,A064900100003 molybdenum, silver and tin the near the Coulomb A064900100004 barrier A064900100005 AUTHOR (A.Nurmela, V.Zazubovich, J.Ralsanen, E.Rauhala, A064900100006 R.Lappalainen) A064900100007 REFERENCE (J,JAP,84,1796,1998) A064900100008 INSTITUTE (2SF HLS) Accelerator laboratory. A064900100009 FACILITY (VDGT,2SF HLS) A064900100010 DETECTOR (SIBAR) Two silicon surface barrier detectors. The A064900100011 detectors were placed at laboratory angles of 135. and A064900100012 165. degrees. A064900100013 METHOD (SITA) A064900100014 ERR-ANALYS (ERR-S,2.,5.,U) The uncertainties in the cross A064900100015 section values, resulting from statistical errors, in A064900100016 the determination of the peak areas, increase from 2% A064900100017 at the low energy end to 5% towards the high energy A064900100018 end of the energy intervals. A064900100019 HISTORY (19991101C) A064900100020 (19991101U) Last checking has been done. A064900100021 (20000717A) Date is corrected A064900100022 (20210315A) SD: Corrections in all Subents. A064900100023 ENDBIB 21 0 A064900100024 NOCOMMON 0 0 A064900100025 ENDSUBENT 24 0 A064900199999 SUBENT A0649002 20210315 A097A064900200001 BIB 5 14 A064900200002 REACTION (29-CU-0(P,EL)29-CU-0,,DA,,RTH) A064900200003 SAMPLE Thin film of natural Cu was fabricated on polished A064900200004 (100) silicon substrate. Just before evaporation the A064900200005 Si substrate was cleaned with Ar+ ion sputtering. The A064900200006 sample was further coated by thin gold film with 37 nm.A064900200007 The energy width of the copper sample film was 40 keV A064900200008 for 3. MeV protons, thickness was 725 nm. A064900200009 MONITOR (79-AU-197(P,EL)79-AU-197,,DA,,RTH) A064900200010 The gold films, for which the scattering was taken A064900200011 to be Rutherford, were to serve as internal ion A064900200012 dose references. A064900200013 STATUS (TABLE) Tbl.I from J.Appl.Phys.,84(1998)1796 A064900200014 HISTORY (20210315A) SD: SF9=EXP deleted from REACTION code. A064900200015 BIB updated. A064900200016 ENDBIB 14 0 A064900200017 NOCOMMON 0 0 A064900200018 DATA 3 74 A064900200019 ANG EN DATA A064900200020 ADEG MEV NO-DIM A064900200021 135. 2.3 1.01 A064900200022 135. 2.4 0.99 A064900200023 135. 2.5 1.01 A064900200024 135. 2.6 1.01 A064900200025 135. 2.7 1.00 A064900200026 135. 2.8 0.99 A064900200027 135. 2.9 0.96 A064900200028 135. 3.0 1.03 A064900200029 135. 3.1 0.98 A064900200030 135. 3.2 1.02 A064900200031 135. 3.3 1.00 A064900200032 135. 3.4 1.02 A064900200033 135. 3.5 0.94 A064900200034 135. 3.7 0.95 A064900200035 135. 3.8 0.89 A064900200036 135. 3.9 0.98 A064900200037 135. 4.0 0.95 A064900200038 135. 4.1 1.03 A064900200039 135. 4.2 1.04 A064900200040 135. 4.3 1.05 A064900200041 135. 4.4 1.00 A064900200042 135. 4.5 0.97 A064900200043 135. 4.7 0.96 A064900200044 135. 4.8 1.00 A064900200045 135. 4.9 0.94 A064900200046 135. 5.0 0.96 A064900200047 135. 5.3 1.01 A064900200048 135. 5.6 0.97 A064900200049 135. 5.7 1.01 A064900200050 135. 5.8 0.96 A064900200051 135. 5.9 0.91 A064900200052 135. 6.0 0.88 A064900200053 135. 6.1 0.91 A064900200054 135. 6.2 0.95 A064900200055 135. 6.3 0.82 A064900200056 135. 6.4 0.94 A064900200057 135. 6.5 0.80 A064900200058 165. 2.3 1.02 A064900200059 165. 2.4 1.00 A064900200060 165. 2.5 1.03 A064900200061 165. 2.6 1.02 A064900200062 165. 2.7 0.98 A064900200063 165. 2.8 1.03 A064900200064 165. 2.9 1.03 A064900200065 165. 3.0 1.00 A064900200066 165. 3.1 1.04 A064900200067 165. 3.2 0.96 A064900200068 165. 3.3 1.01 A064900200069 165. 3.4 1.09 A064900200070 165. 3.5 1.06 A064900200071 165. 3.7 1.08 A064900200072 165. 3.8 1.06 A064900200073 165. 3.9 1.05 A064900200074 165. 4.0 1.05 A064900200075 165. 4.1 1.01 A064900200076 165. 4.2 1.03 A064900200077 165. 4.3 1.00 A064900200078 165. 4.4 0.98 A064900200079 165. 4.5 0.96 A064900200080 165. 4.7 0.99 A064900200081 165. 4.8 0.95 A064900200082 165. 4.9 0.91 A064900200083 165. 5.0 0.96 A064900200084 165. 5.3 0.90 A064900200085 165. 5.6 0.80 A064900200086 165. 5.7 0.75 A064900200087 165. 5.8 0.80 A064900200088 165. 5.9 0.62 A064900200089 165. 6.0 0.70 A064900200090 165. 6.1 0.66 A064900200091 165. 6.2 0.65 A064900200092 165. 6.3 0.56 A064900200093 165. 6.4 0.66 A064900200094 165. 6.5 0.51 A064900200095 ENDDATA 76 0 A064900200096 ENDSUBENT 95 0 A064900299999 SUBENT A0649003 20210315 A097A064900300001 BIB 5 14 A064900300002 REACTION (42-MO-0(P,EL)42-MO-0,,DA,,RTH) A064900300003 SAMPLE Thin film of natural Mo was fabricated on polished A064900300004 (100) silicon substrate. Just before evaporation the A064900300005 Si substrate was cleaned with Ar+ ion sputtering. The A064900300006 sample was further coated by thin gold film with 36 nm.A064900300007 The energy width of the copper sample film was 5 keV A064900300008 for 3. MeV protons, thickness was 91 nm. A064900300009 MONITOR (79-AU-197(P,EL)79-AU-197,,DA,,RTH) A064900300010 The gold films, for which the scattering was taken A064900300011 to be Rutherford, were to serve as internal ion A064900300012 dose references. A064900300013 STATUS (TABLE) Tbl.I from J.Appl.Phys.,84(1998)1796 A064900300014 HISTORY (20210315A) SD: SF9=EXP deleted from REACTION code. A064900300015 BIB updated. A064900300016 ENDBIB 14 0 A064900300017 NOCOMMON 0 0 A064900300018 DATA 3 50 A064900300019 ANG EN DATA A064900300020 ADEG MEV NO-DIM A064900300021 135. 3.5 0.96 A064900300022 135. 3.6 0.99 A064900300023 135. 3.9 0.98 A064900300024 135. 4.0 1.00 A064900300025 135. 4.1 0.99 A064900300026 135. 4.2 0.99 A064900300027 135. 4.3 0.97 A064900300028 135. 4.4 1.01 A064900300029 135. 4.5 1.03 A064900300030 135. 4.6 0.98 A064900300031 135. 4.7 1.01 A064900300032 135. 4.8 0.99 A064900300033 135. 5.0 1.02 A064900300034 135. 5.1 0.91 A064900300035 135. 5.2 0.95 A064900300036 135. 5.3 1.02 A064900300037 135. 5.4 1.01 A064900300038 135. 5.5 0.89 A064900300039 135. 5.6 0.91 A064900300040 135. 5.7 0.95 A064900300041 135. 5.9 0.87 A064900300042 135. 6.0 0.65 A064900300043 135. 6.1 0.77 A064900300044 135. 6.3 0.86 A064900300045 135. 6.5 0.44 A064900300046 165. 3.5 1.00 A064900300047 165. 3.6 1.02 A064900300048 165. 3.9 1.00 A064900300049 165. 4.0 1.02 A064900300050 165. 4.1 1.00 A064900300051 165. 4.2 1.02 A064900300052 165. 4.3 0.98 A064900300053 165. 4.4 1.00 A064900300054 165. 4.5 0.97 A064900300055 165. 4.6 1.02 A064900300056 165. 4.7 0.98 A064900300057 165. 4.8 1.02 A064900300058 165. 5.0 0.95 A064900300059 165. 5.1 0.96 A064900300060 165. 5.2 0.86 A064900300061 165. 5.3 0.98 A064900300062 165. 5.4 0.92 A064900300063 165. 5.5 0.90 A064900300064 165. 5.6 0.87 A064900300065 165. 5.7 0.86 A064900300066 165. 5.9 0.84 A064900300067 165. 6.0 0.91 A064900300068 165. 6.1 0.84 A064900300069 165. 6.3 0.82 A064900300070 165. 6.5 0.82 A064900300071 ENDDATA 52 0 A064900300072 ENDSUBENT 71 0 A064900399999 SUBENT A0649004 20210315 A097A064900400001 BIB 5 14 A064900400002 REACTION (47-AG-0(P,EL)47-AG-0,,DA,,RTH) A064900400003 SAMPLE Thin film of natural Ag was fabricated on polished A064900400004 (100) silicon substrate. Just before evaporation the A064900400005 Si substrate was cleaned with Ar+ ion sputtering. The A064900400006 sample was further coated by thin gold film with 34 nm.A064900400007 The energy width of the copper sample film was 7 keV A064900400008 for 3. MeV protons, thickness was 129 nm. A064900400009 MONITOR (79-AU-197(P,EL)79-AU-197,,DA,,RTH) A064900400010 The gold films, for which the scattering was taken A064900400011 to be Rutherford, were to serve as internal ion A064900400012 dose references. A064900400013 STATUS (TABLE) Tbl.I from J.Appl.Phys.,84(1998)1796 A064900400014 HISTORY (20210315A) SD: SF9=EXP deleted from REACTION code. A064900400015 BIB updated. A064900400016 ENDBIB 14 0 A064900400017 NOCOMMON 0 0 A064900400018 DATA 3 39 A064900400019 ANG EN DATA A064900400020 ADEG MEV NO-DIM A064900400021 135. 4.0 0.97 A064900400022 135. 4.1 1.00 A064900400023 135. 4.2 0.97 A064900400024 135. 4.3 1.00 A064900400025 135. 4.5 1.02 A064900400026 135. 4.7 0.98 A064900400027 135. 4.8 0.99 A064900400028 135. 4.9 1.00 A064900400029 135. 5.0 0.96 A064900400030 135. 5.1 0.96 A064900400031 135. 5.3 0.93 A064900400032 135. 5.5 0.92 A064900400033 135. 5.7 0.92 A064900400034 135. 5.9 0.92 A064900400035 135. 6.1 0.90 A064900400036 135. 6.3 0.87 A064900400037 135. 6.5 0.92 A064900400038 165. 3.5 1.05 A064900400039 165. 3.6 1.03 A064900400040 165. 3.7 0.97 A064900400041 165. 3.8 1.06 A064900400042 165. 3.9 1.05 A064900400043 165. 4.0 1.03 A064900400044 165. 4.1 1.05 A064900400045 165. 4.2 1.01 A064900400046 165. 4.3 0.98 A064900400047 165. 4.5 1.02 A064900400048 165. 4.7 1.00 A064900400049 165. 4.8 1.00 A064900400050 165. 4.9 0.96 A064900400051 165. 5.0 0.99 A064900400052 165. 5.1 0.98 A064900400053 165. 5.3 0.96 A064900400054 165. 5.5 0.98 A064900400055 165. 5.7 0.97 A064900400056 165. 5.9 0.89 A064900400057 165. 6.1 0.83 A064900400058 165. 6.3 0.81 A064900400059 165. 6.5 0.92 A064900400060 ENDDATA 41 0 A064900400061 ENDSUBENT 60 0 A064900499999 SUBENT A0649005 20210315 A097A064900500001 BIB 5 15 A064900500002 REACTION (50-SN-0(P,EL)50-SN-0,,DA,,RTH) A064900500003 SAMPLE Thin film of natural Sn was fabricated on polished A064900500004 (100) silicon substrate. Just before evaporation the A064900500005 Si substrate was cleaned with Ar+ ion sputtering. The A064900500006 sample was further coated by thin bismuth A064900500007 film with 44 nm. A064900500008 The energy width of the copper sample film was 2 keV A064900500009 for 3. MeV protons, thickness was 65 nm. A064900500010 MONITOR (83-BI-209(P,EL)83-BI-209,,DA,,RTH) A064900500011 The bismuth films, for which the scattering was taken A064900500012 to be Rutherford, were to serve as internal ion A064900500013 dose references. A064900500014 STATUS (TABLE) Tbl.I from J.Appl.Phys.,84(1998)1796 A064900500015 HISTORY (20210315A) SD: SF9=EXP deleted from REACTION code. A064900500016 BIB updated. A064900500017 ENDBIB 15 0 A064900500018 NOCOMMON 0 0 A064900500019 DATA 3 26 A064900500020 ANG EN DATA A064900500021 ADEG MEV NO-DIM A064900500022 135. 4.5 0.96 A064900500023 135. 4.7 1.01 A064900500024 135. 4.9 1.02 A064900500025 135. 5.1 0.96 A064900500026 135. 5.3 0.95 A064900500027 135. 5.5 1.00 A064900500028 135. 5.7 1.03 A064900500029 135. 5.9 0.99 A064900500030 135. 6.1 0.93 A064900500031 135. 6.2 0.83 A064900500032 135. 6.3 0.90 A064900500033 135. 6.4 0.81 A064900500034 135. 6.5 0.47 A064900500035 165. 4.5 1.00 A064900500036 165. 4.7 0.97 A064900500037 165. 4.9 0.96 A064900500038 165. 5.1 1.00 A064900500039 165. 5.3 1.00 A064900500040 165. 5.5 1.02 A064900500041 165. 5.7 1.00 A064900500042 165. 5.9 1.02 A064900500043 165. 6.1 1.01 A064900500044 165. 6.2 0.97 A064900500045 165. 6.3 0.80 A064900500046 165. 6.4 0.88 A064900500047 165. 6.5 0.77 A064900500048 ENDDATA 28 0 A064900500049 ENDSUBENT 48 0 A064900599999 ENDENTRY 5 0 A064999999999